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Min-Su Kim
Min-Su Kim
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Effect of dissolved gases in water on acoustic cavitation and bubble growth rate in 0.83 MHz megasonic of interest to wafer cleaning
BK Kang, MS Kim, JG Park
Ultrasonics sonochemistry 21 (4), 1496-1503, 2014
482014
Effect of acoustic cavitation on dissolved gases and their characterization during megasonic cleaning
BK Kang, MS Kim, SH Lee, H Sohn, JG Park
ECS Transactions 41 (5), 101, 2011
192011
Development of CO2 gas cluster cleaning method and its characterization
H Choi, H Kim, D Yoon, JW Lee, BK Kang, MS Kim, JG Park, SB Kwon, ...
Microelectronic engineering 102, 87-90, 2013
182013
Optimization of DIO3 with megasonic cleaning of Ru capped EUVL mask for effective carbon contaminant removal
SH Lee, BK Kang, MS Kim, JS Lim, JH Jeong, JG Park
ECS Transactions 41 (5), 131, 2011
172011
Investigation of oxide layer removal mechanism using reactive gases
HT Kim, JS Lim, MS Kim, HJ Oh, DH Ko, GD Kim, WG Shin, JG Park
Microelectronic Engineering 135, 17-22, 2015
102015
Adhesion and removal behavior of particulate contaminants from EUV mask
MS Kim, M Purushothaman, HT Kim, HJ Song, JG Park
Colloids and Surfaces A 535, 83–88, 2017
6*2017
Contamination Removal From UV and EUV Photomasks
RP Venkatesh, MS Kim, JG Park
Developments in Surface Contamination and Cleaning: Methods for Surface …, 2017
62017
Adsorption of sodium dodecyl sulfate on cleaning of an N-polar GaN surface in an alkaline solution
MS Kim, NR Paluvai, HT Kim, JG Park
Materials Science and Engineering: B 222, 1-6, 2017
52017
Characterization of Free-Standing Nano-Membranes by Using Ellipsometry
S Park, C Lee, I An, MS Kim, JG Park, J Ahn
Journal of the Korean Physical Society 72, 868-872, 2018
42018
Influence of a wrinkle in terms of critical dimension variation caused by transmission nonuniformity and a particle defect on extreme ultraviolet pellicle
GJ Kim, IS Kim, SG Lee, M Yeung, MS Kim, JG Park, HK Oh
Journal of Micro/Nanolithography, MEMS, and MOEMS 16 (4), 041008-041008, 2017
42017
Removal of Nano-sized Particles Using Carbon Dioxide (CO2) Gas Cluster Cleaning without Pattern Damage
MS Kim, T Kim, JG Park
Particulate Science and Technology 33 (5), 558-561, 2015
32015
Removal of UV-cured resin using a hybrid cleaning process for nanoimprint lithography
MS Kim, BK Kang, M Ramachandran, JK Kim, BK Lee, JG Park
Microelectronic engineering 114, 126-130, 2014
32014
Effective Carbon Contaminant Cleaning Condition Using Ozone Dissolved Water and Megasonic for Ru-Capped Extreme Ultraviolet Lithography Mask
S Lee, B Kang, M Kim, J Ahn, H Cho, H Lee, JG Park
Japanese Journal of Applied Physics 51 (9R), 096503, 2012
32012
Impact of non-uniform wrinkles for a multi-stack pellicle in EUV lithography
GJ Kim, IS Kim, M Yeung, MS Kim, JG Park, HK Oh
Extreme Ultraviolet (EUV) Lithography VIII 10143, 373-383, 2017
22017
Prevention of metal contamination in sub 50 nm SC1 cleaning process
HT Kim, GH Park, BJ Cho, JH Lee, MS Kim, JY Kim, JG Park
ECS Transactions 69 (8), 69, 2015
22015
Effect of particle contamination on extreme ultraviolet (EUV) mask and megasonic cleaning process for its removal
MS Kim, HR Ji, IC Choi, HT Kim, SH Jang, J Lee, IS Kim, JH Kim, HK Oh, ...
ECS Transactions 69 (8), 101, 2015
22015
Acoustic cavitation behavior in isopropyl alcohol added cleaning solution
BK Kang, JH Jeong, MS Kim, HS Sohn, AA Busnaina, JG Park
Solid State Phenomena 195, 169-172, 2013
22013
Removal of EUV exposed hydrocarbon from Ru capping layer of EUV mask using the mixture of alkaline solutions and organic solvents
MS Kim, M Purushothaman, HT Kim, HJ Song, YW Kim, JH Ahn, HK Oh, ...
Colloids and Surfaces A: Physicochemical and Engineering Aspects 555, 72-79, 2018
12018
Optimization of FPD cleaning system and processing by using a two-phase flow nozzle
MS Kim, HR Kim, HT Kim, JG Park
Korean Journal of Materials Research 24 (8), 429-433, 2014
12014
Removal of UV cured resin using hybrid cleaning method
MS Kim, BK Kang, JK Kim, BK Lee, JG Park
Solid State Phenomena 195, 30-33, 2013
12013
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Artículos 1–20