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Jason Kenney
Jason Kenney
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Inductively coupled plasma source with symmetrical RF feed
JA Kenney, JD Carducci, KS Collins, R Fovell, K Ramaswamy, S Rauf
US Patent 9,928,987, 2018
2762018
Multiple coil inductively coupled plasma source with offset frequencies and double-walled shielding
JA Kenney, JD Carducci, KS Collins, R Fovell, K Ramaswamy, S Rauf
US Patent 10,170,279, 2019
2342019
Electrochemical machining with ultrashort voltage pulses: modelling of charging dynamics and feature profile evolution
JA Kenney, GS Hwang
Nanotechnology 16 (7), S309, 2005
612005
Two-dimensional computational model for electrochemical micromachining with ultrashort voltage pulses
JA Kenney, GS Hwang, W Shin
Applied physics letters 84 (19), 3774-3776, 2004
502004
Composite edge ring
O Joubert, JA Kenney, S Srinivasan, J Rogers, R Dhindsa, ...
US Patent App. 29/561,163, 2017
342017
Etching with atomic precision by using low electron temperature plasma
L Dorf, JC Wang, S Rauf, GA Monroy, Y Zhang, A Agarwal, J Kenney, ...
Journal of Physics D: Applied Physics 50 (27), 274003, 2017
342017
Three-dimensional model of magnetized capacitively coupled plasmas
S Rauf, J Kenney, K Collins
Journal of Applied Physics 105 (10), 2009
312009
Etch trends in electrochemical machining with ultrashort voltage pulses: Predictions from theory and simulation
JA Kenney, GS Hwang
Electrochemical and Solid-State Letters 9 (1), D1, 2005
272005
Influence of inhomogeneous magnetic field on the characteristics of very high frequency capacitively coupled plasmas
K Bera, S Rauf, J Kenney, L Dorf, K Collins
Journal of Applied Physics 107 (5), 2010
242010
Three-coil inductively coupled plasma source with individually controlled coil currents from a single RF power generator
L Dorf, S Rauf, J Liu, JA Kenney, A Nguyen, KS Collins, K Ramaswamy, ...
US Patent 9,082,591, 2015
232015
Three-coil inductively coupled plasma source with individually controlled coil currents from a single RF power generator
L Dorf, S Rauf, J Liu, JA Kenney, A Nguyen, KS Collins, K Ramaswamy, ...
US Patent 9,082,591, 2015
232015
Three-coil inductively coupled plasma source with individually controlled coil currents from a single RF power generator
L Dorf, S Rauf, J Liu, JA Kenney, A Nguyen, KS Collins, K Ramaswamy, ...
US Patent 9,111,722, 2015
212015
Modeling of low pressure plasma sources for microelectronics fabrication
A Agarwal, K Bera, J Kenney, A Likhanskii, S Rauf
Journal of Physics D: Applied Physics 50 (42), 424001, 2017
182017
Prediction of stochastic behavior in differential charging of nanopatterned dielectric surfaces during plasma processing
JA Kenney, GS Hwang
Journal of applied physics 101 (4), 2007
182007
Inductively coupled plasma source with multiple dielectric windows and window-supporting structure
A Nguyen, KS Collins, K Ramaswamy, S Rauf, JD Carducci, ...
US Patent 9,896,769, 2018
162018
Symmetrical inductively coupled plasma source with coaxial RF feed and coaxial shielding
JA Kenney, JD Carducci, KS Collins, R Fovell, K Ramaswamy, S Rauf
US Patent 10,249,470, 2019
152019
Ion energy distribution functions in a dual-frequency low-pressure capacitively-coupled plasma: experiments and particle-in-cell simulation
JC Wang, P Tian, J Kenney, S Rauf, I Korolov, J Schulze
Plasma Sources Science and Technology 30 (7), 075031, 2021
142021
Symmetrical inductively coupled plasma source with symmetrical flow chamber
A Nguyen, KS Collins, K Ramaswamy, S Rauf, JD Carducci, ...
US Patent 9,745,663, 2017
142017
Symmetrical inductively coupled plasma source with side RF feeds and RF distribution plates
JD Carducci, KS Collins, R Fovell, JA Kenney, K Ramaswamy, S Rauf
US Patent 9,082,590, 2015
142015
Effect of segmenting powered electrode on plasma uniformity in large-area capacitively coupled plasma discharge
Z Chen, J Kenney, S Rauf, K Collins, T Tanaka, N Hammond, J Kudela
IEEE Transactions on Plasma Science 39 (11), 2526-2527, 2011
122011
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