| Apparatus and method for radio frequency de-coupling and bias voltage control in a plasma reactor A Fischer US Patent 6,770,166, 2004 | 168 | 2004 |
| Plasma confinement structures in plasma processing systems E Hudson, A Fischer US Patent 8,540,844, 2013 | 164 | 2013 |
| Temperature controlled hot edge ring assembly for reducing plasma reactor etch rate drift A Fischer, P Loewenhardt US Patent 7,244,336, 2007 | 135 | 2007 |
| Heat transfer system for improved semiconductor processing uniformity A Fischer US Patent 7,244,311, 2007 | 109 | 2007 |
| Radio‐frequency‐magnetron‐sputtered CdS/CdTe solar cells on soda‐lime glass ADC M. Shao, A. Fischer, D. Grecu, U. Jayamaha, E. Bykov, G. Contreras ... Applied Physics Letters 69, 3045, 1998 | 106* | 1998 |
| Plasma processor with electrode simultaneously responsive to plural frequencies V Vahedi, P Loewenhardt, A Ellingboe, A Kuthi, A Fischer US Patent 6,841,943, 2005 | 93 | 2005 |
| Plasma processing system apparatus, and method for delivering RF power to a plasma processing A Fischer, B Kadkhodayan, A Kuthi US Patent 6,242,360, 2001 | 84 | 2001 |
| Thermal atomic layer etching: A review A Fischer, A Routzahn, SM George, T Lill Journal of Vacuum Science & Technology A 39 (3), 2021 | 81 | 2021 |
| Plasma processing apparatus and method for confining an RF plasma under very high gas flow and RF power density conditions A Fischer, D Trussell, B Kennedy, P Loewenhardt US Patent 6,744,212, 2004 | 81 | 2004 |
| Method and apparatus to detect fault conditions of plasma processing reactor D Keil, E Hudson, C Kimball, A Fischer US Patent 7,829,468, 2010 | 63 | 2010 |
| Methods and apparatus for selective pre-coating of a plasma processing chamber A Fischer US Patent 7,578,258, 2009 | 62 | 2009 |
| Hybrid RF capacitively and inductively coupled plasma source using multifrequency RF powers and methods of use thereof A Marakhtanov, R Dhindsa, E Hudson, A Fischer US Patent 7,837,826, 2010 | 60 | 2010 |
| Methods and apparatus for preventing plasma un-confinement events in a plasma processing chamber A Fischer, R Dhindsa US Patent 7,740,736, 2010 | 57 | 2010 |
| Multi-part electrode for a semiconductor processing plasma reactor and method of replacing a portion of a multi-part electrode A Fischer, WS Kennedy, P Loewenhardt, D Trussell US Patent 7,861,667, 2011 | 54 | 2011 |
| Edge ring assembly with dielectric spacer ring J Chang, A Fischer, B Kadkhodayan US Patent App. 11/198,296, 2007 | 46 | 2007 |
| Controlling ion energy distribution in plasma processing systems A Fischer, E Hudson US Patent 9,887,069, 2018 | 44 | 2018 |
| Showerhead electrodes and showerhead electrode assemblies having low-particle performance for semiconductor material processing apparatuses A Fischer, R Dhindsa US Patent 8,069,817, 2011 | 43 | 2011 |
| RF pulsing of a narrow gap capacitively coupled reactor P Loewenhardt, M Srinivasan, A Fischer US Patent 7,976,673, 2011 | 40 | 2011 |
| Improvement of CdTe solar cell performance with discharge control during film deposition by magnetron sputtering ADC R. Wendt, A. Fischer, D. Grecu Journal of Applied Physics 84(5):2920-2925 84 (5), 2920-2925, 1998 | 37* | 1998 |
| Wafer bevel polymer removal J Chang, A Fischer, P Loewenhardt US Patent 7,597,816, 2009 | 35 | 2009 |
Thorsten LillClarycon Nanotechnology ResearchDirección de correo verificada de claryconresearch.com
