| Ultrafast Assembly of PS‐PDMS Block Copolymers on 300 mm Wafers by Blending with Plasticizers J Arias‐Zapata, S Böhme, J Garnier, C Girardot, A Legrain, M Zelsmann Advanced Functional Materials 26 (31), 5690-5700, 2016 | 30 | 2016 |
| CF4/H2 Plasma Cleaning of Graphene Regenerates Electronic Properties of the Pristine Material D Ferrah, O Renault, D Marinov, J Arias-Zapata, N Chevalier, D Mariolle, ... ACS Applied Nano Materials 2 (3), 1356-1366, 2019 | 26 | 2019 |
| Sub-10 nm Silicon Nanopillar Fabrication Using Fast and Brushless Thermal Assembly of PS-b-PDMS Diblock Copolymer J Garnier, J Arias-Zapata, O Marconot, S Arnaud, S Böhme, C Girardot, ... ACS applied materials & interfaces 8 (15), 9954-9960, 2016 | 26 | 2016 |
| Straightforward Integration Flow of a Silicon-Containing Block Copolymer for Line–Space Patterning A Legrain, G Fleury, M Mumtaz, C Navarro, J Arias-Zapata, X Chevalier, ... ACS applied materials & interfaces 9 (49), 43043-43050, 2017 | 22 | 2017 |
| Fully CMOS-compatible passive TiO2-based memristor crossbars for in-memory computing A El Mesoudy, G Lamri, R Dawant, J Arias-Zapata, P Gliech, Y Beilliard, ... Microelectronic Engineering 255, 111706, 2022 | 21 | 2022 |
| Engineering self-assembly of a high-χ block copolymer for large-area fabrication of transistors based on functional graphene nanoribbon arrays J Arias-Zapata, JD Garnier, HA Mehedi, A Legrain, B Salem, G Cunge, ... Chemistry of Materials 31 (9), 3154-3162, 2019 | 18 | 2019 |
| Large‐Scale Formation of Uniform Porous Ge Nanostructures with Tunable Physical Properties T Hanuš, J Arias‐Zapata, B Ilahi, PO Provost, J Cho, K Dessein, ... Advanced Materials Interfaces 10 (14), 2202495, 2023 | 12 | 2023 |
| Wafer-scale detachable monocrystalline germanium nanomembranes for the growth of III–V materials and substrate reuse N Paupy, ZO Elhmaidi, A Chapotot, T Hanuš, J Arias-Zapata, B Ilahi, ... Nanoscale Advances 5 (18), 4696-4702, 2023 | 8 | 2023 |
| High throughput sub-10 nm metallic particles organization on templates made by block copolymer self-assembly and nanoimprint J Arias-Zapata, J Cordeiro, S Böhme, C Girardot, J Garnier, P Bézard, ... Microelectronic Engineering 141, 155-159, 2015 | 6 | 2015 |
| Germanium surface wet-etch-reconditioning for porous lift-off and substrate reuse A Chapotot, B Ilahi, J Arias-Zapata, T Hanuš, A Ayari, G Hamon, J Cho, ... Materials Science in Semiconductor Processing 168, 107851, 2023 | 5 | 2023 |
| Annealing treatments of cylindrical siloxane-based block copolymers optimized for nanomanufacturing S Böhme, J Arias-Zapata, J Garnier, C Girardot, A Legrain, M Zelsmann Micro and Nano Engineering 1, 56-62, 2018 | 4 | 2018 |
| Effective patterning and cleaning of graphene by plasma etching and block copolymer lithography for nanoribbon fabrication J Arias-Zapata, D Ferrah, H Mehedi, G Cunge, M Zelsmann Journal of Vacuum Science & Technology A 36 (5), 2018 | 3 | 2018 |
| Graphene structuration by self-assembly of high-χ block copolymers J Arias-Zapata, D Ferrah, J Garnier, S Böhme, O Mouray, H Okuno, ... Materials Today: Proceedings 4 (7), 6827-6834, 2017 | 3 | 2017 |
| Multiple substrate reuse: A straightforward reconditioning of Ge wafers after porous separation A Chapotot, J Arias-Zapata, T Hanuš, B Ilahi, N Paupy, V Daniel, ... 2022 IEEE 49th Photovoltaics Specialists Conference (PVSC), 0530-0530, 2022 | 2 | 2022 |
| A route for industry compatible directed self-assembly of high-chi PS-PDMS block copolymers S Böhme, C Girardot, J Garnier, J Arias-Zapata, S Arnaud, R Tiron, ... Alternative Lithographic Technologies VIII 9777, 405-414, 2016 | 2 | 2016 |
| Nanoscale Advances N Paupy, ZO Elhmaidi, A Chapotot, T Hanuš, J Arias-Zapata, A Boucherif | | 2023 |
| Fabrication of ultrathin Ge template for growth of multijunction solar cells based on wafer-scale porous Ge T Hanuš, J Arias-Zapata, B Ilahi, PO Provost, A Chapotot, A Boucherif 2022 IEEE 49th Photovoltaics Specialists Conference (PVSC), 1291-1291, 2022 | | 2022 |
| Reuse of Ge substrates for cost-effective fabrication of III-V/Ge thin solar cells A Chapotot, J Arias-Zapata, J Chrétien, T Hanus, N Paupy, V Daniel, ... 49th Photovoltaic Specialists Conference, 2022 | | 2022 |
| PEELER process: wafer scale epitaxial layer release and substrate reuse N Paupy, ZO Elhmaidi, A Chapotot, T Hanuš, J Arias-Zapata, B Ilahi, ... Advanced Epitaxy for Freestanding Membranes and 2D Materials (AEFM), 2022 | | 2022 |
| Micro and Nano Engineering S Böhme, J Arias-Zapata, J Garnier, C Girardot, A Legrain, M Zelsmann | | 2018 |
Marc ZelsmannCNRS, Laboratoire des Technologies de la Microélectronique, Grenoble, FranceDirección de correo verificada de cea.fr
