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Uthayasankaran Peralagu
Uthayasankaran Peralagu
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CMOS-compatible GaN-based devices on 200mm-Si for RF applications: Integration and Performance
U Peralagu, A Alian, V Putcha, A Khaled, R Rodriguez, ...
2019 IEEE International Electron Devices Meeting (IEDM), 17.2. 1-17.2. 4, 2019
622019
InAs N-MOSFETs with record performance of Ion= 600 μA/μm at Ioff= 100 nA/μm (Vd= 0.5 V)
SW Chang, X Li, R Oxland, SW Wang, CH Wang, R Contreras-Guerrero, ...
2013 IEEE International Electron Devices Meeting, 16.1. 1-16.1. 4, 2013
472013
Low-frequency noise investigation of GaN/AlGaN metal–oxide–semiconductor high-electron-mobility field-effect transistor with different gate length and orientation
K Takakura, V Putcha, E Simoen, AR Alian, U Peralagu, N Waldron, ...
IEEE Transactions on Electron Devices 67 (8), 3062-3068, 2020
282020
GaN-on-Si mm-wave RF devices integrated in a 200mm CMOS Compatible 3-Level Cu BEOL
B Parvais, A Alian, U Peralagu, R Rodriguez, S Yadav, A Khaled, ...
2020 IEEE International Electron Devices Meeting (IEDM), 8.1. 1-8.1. 4, 2020
272020
Electrical and physical characterization of the Al2O3/p-GaSb interface for 1%, 5%, 10%, and 22%(NH4) 2S surface treatments
U Peralagu, IM Povey, P Carolan, J Lin, R Contreras-Guerrero, ...
Applied Physics Letters 105 (16), 2014
252014
InAs N-MOSFETs with record performance of Ion= 600 µA/µm at Ioff= 100 nA/µm (Vd= 0.5 V)
SW Chang, X Li, R Oxland, SW Wang, CH Wang, R Contreras-Guerrero, ...
Proceedings of Technical Digest of the IEEE International Electron Devices …, 2013
232013
The impact of forming gas annealing on the electrical characteristics of sulfur passivated Al2O3/In0.53Ga0.47As (110) metal-oxide-semiconductor capacitors
YC Fu, U Peralagu, DAJ Millar, J Lin, I Povey, X Li, S Monaghan, ...
Applied Physics Letters 110 (14), 142905, 2017
212017
Critical current diffraction pattern of SIFS Josephson junctions with a step-like F-layer
M Weides, U Peralagu, H Kohlstedt, J Pfeiffer, M Kemmler, C Gürlich, ...
Superconductor science and technology 23 (9), 095007, 2010
112010
Surface state spectrum of AlGaN/AlN/GaN extracted from static equilibrium electrostatics
H Yu, A Alian, U Peralagu, M Zhao, N Waldron, B Parvais, N Collaert
IEEE Transactions on Electron Devices 68 (11), 5559-5564, 2021
102021
From 5G to 6G: Will compound semiconductors make the difference?
N Collaert, A Alian, A Banerjee, V Chauhan, RY ElKashlan, B Hsu, ...
2020 IEEE 15th International Conference on Solid-State & Integrated Circuit …, 2020
102020
Exploring the DC reliability metrics for scaled GaN-on-Si devices targeted for RF/5G applications
V Putcha, E Bury, J Franco, A Walke, SE Zhao, U Peralagu, M Zhao, ...
2020 IEEE International Reliability Physics Symposium (IRPS), 1-8, 2020
102020
CMOS compatible GaN-on-Si HEMT technology for RF applications: analysis of substrate losses and non-linearities
S Yadav, P Cardinael, M Zhao, K Vondkar, U Peralagu, A Alian, A Khaled, ...
2021 International Conference on IC Design and Technology (ICICDT), 1-4, 2021
92021
Thermal budget increased alloy disorder scattering of 2DEG in III–N heterostructures
H Yu, B Parvais, M Zhao, R Rodriguez, U Peralagu, A Alian, N Collaert
Applied Physics Letters 120 (21), 2022
82022
Analysis of gate-metal resistance in CMOS-compatible RF GaN HEMTs
RY ElKashlan, R Rodriguez, S Yadav, A Khaled, U Peralagu, A Alian, ...
IEEE Transactions on Electron Devices 67 (11), 4592-4596, 2020
82020
(Plenary) the revival of compound semiconductors and how they will change the world in a 5G/6G era
N Collaert, AR Alian, A Banerjee, V Chauhan, RY ElKashlan, B Hsu, ...
ECS Transactions 98 (5), 15, 2020
72020
Back barrier trapping induced resistance dispersion in GaN HEMT: mechanism, modeling, and solutions
H Yu, B Parvais, U Peralagu, RY ElKashlan, R Rodriguez, A Khaled, ...
2022 International Electron Devices Meeting (IEDM), 30.6. 1-30.6. 4, 2022
62022
Leakage mechanism in ion implantation isolated AlGaN/GaN heterostructures
H Yu, V Putcha, U Peralagu, M Zhao, S Yadav, A Alian, B Parvais, ...
Journal of Applied Physics 131 (3), 2022
62022
ESD HBM discharge model in RF GaN-on-Si (MIS) HEMTs
WM Wu, SH Chen, A Sibaja-Hernandez, S Yadav, U Peralagu, H Yu, ...
2021 IEEE International Electron Devices Meeting (IEDM), 39.5. 1-39.5. 4, 2021
62021
Gate dielectric material influence on DC behavior of MO (I) SHEMT devices operating up to 150° C
PGD Agopian, GJ Carmo, JA Martino, E Simoen, U Peralagu, B Parvais, ...
Solid-State Electronics 185, 108091, 2021
62021
Towards a Vertical and Damage Free Post-Etch InGaAs Fin Profile: Dry Etch Processing, Sidewall Damage Assessment and Mitigation Options
U Peralagu, X Li, O Ignatova, YC Fu, DAJ Millar, MJ Steer, IM Povey, ...
ECS Transactions 69 (5), 15, 2015
62015
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